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Patent Pick: Cosmetic Particle Deposition

November 3, 2015 | Contact Author | By: Cosmetics & Toiletries editors
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Keywords: L'Oréal | particle | deposition | rinse-off | hydrophobic | cationic polymer

Abstract: Patent Picks are chosen by the editors from publicly available sources. Today's highlight, from L'Oréal, is an invention aimed at improving the deposition of cosmetic particles to skin or hair.

Patent Picks are chosen by the editors from publicly available sources. Today's highlight, from L'Oréal, is an invention aimed at improving the deposition of cosmetic particles to skin or hair.

Cosmetic composition with improved particle deposition
WIPO Patent Application WO/2015/163337
Publication date: Oct. 29, 2015
Assignee: L'Oréal and M. Yamaguchi

According to these inventors, given the range of benefits delivered by water-insoluble particles, it is desirable for rinse-off compositions to deposit them onto various substrates. However, since large portions of them are washed away during rinsing, efficient deposition and retention of the particles on the surface is difficult to obtain.

Described here is a composition to improve particle deposition. It comprises: a) at least one anionic surfactant; b) at least one hydrophobically-modified cationic polymer; c) at least one water-insoluble particle with at least an inorganic part and/or a polymeric part and/or a visible light-absorbing part; and d) at least 40% w/w water. The amount of the hydrophobically-modified cationic polymer is most preferably 0.05% w/w.

This composition is said to effectively deposit water-insoluble particles on the surface of various substrates such as skin and hair to deliver the benefits derived from the particles to the surface.