CVD Techniques

Chemical Vapor Deposition (CVD) is a technique used wildly in the semiconductor industry to produce high-purity solid materials. During the CVD process, the substrate to be coated is exposed to one or more precursor gases that react and/or decompose on the substrate surface to produce the desired deposit. For depositing silicon, precursor gases can be silane, disilane or trichlorosilane. In a typical CVD process, the precursor gas is decomposed by means of a heat source, such as a tubular oven in the simplest version, and is called hotwall thermal CVD.