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Patent Pick: Skin-lifting Chitosan

November 24, 2015 | Contact Author | By: Jennifer Novoseletsky and Rachel Grabenhofer
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Keywords: chitosan | skin-lifting | dissolving

Abstract: Patent Picks are chosen by the editors from publicly available sources. Today's technology relates to a fast-dissolving chitosan for skin-lifting properties.

Patent Picks are chosen by the editors from publicly available sources. Today's technology relates to a fast-dissolving chitosan for skin-lifting properties.

Skin-lifting cosmetic composition containing fast-dissolving chitosan
WIPO Patent Application WO/2015/174772
Publication date: Nov. 19, 2015
Assignee: M.K Son and S.Y. Park

The cosmetic composition described herein contains no preservatives, surfactants or the like, which are capable of imparting adverse effects on the skin. Instead, the composition contains chitosan in an undissolved state that can quickly be dissolved by the user just before use. This ingredient is suitable for skin-lifting effects.

Specifically, the composition comprises 0.5-6.0% w/w chitosan, dissolved with a dissolution velocity in the range of 1-15 min, in a solvent having a degree of deacetylation between 80-100% and a pH from 3.5-7.5. The chitosan is physically separated from the solvent and contained in an undissolved state.