Patent Picks—Azo Quinolinium, Permanent Waving, Anionic Surfactants, Cassia Derivatives and More for Hair Care

By: Katie Anderson (Schaefer), Cosmetics & Toiletries magazine

Posted: November 9, 2011

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It is generally known that permanent waving is carried out in two steps, the reductive splitting of the cysteine disulfide bonds in the hair by a reducing agent, and the subsequent neutralization by application of an oxidizing agent, whereby the cysteine disulfide bonds are restored. The reducing agent still most frequently used today is thioglycolic acid, also in form of the salts thereof, in particular its ammonium salt, although numerous other thio compounds have been proposed for this purpose, which, however, mostly did not succeed.

The compositions containing thioglycollates are customarily applied at a pH 7–10, specifically 8.5 and 9.5. Such compositions vary in their waving and/or straightening performance and, therefore, there is still need for further improvement. The present invention starts from the task of providing a composition for the permanent shaping of human hair with waving and straightening performance. For waved hair, it is especially important that the hair has elasticity and bounce

Monomer 5, 6-diphenyl-1.2.4-traizinic derivatives and the use thereof
US Patent 8053573
Publication Date: Nov. 8, 2011
Assignee: Pierre Fabre Dermo-Cosmetique

The invention relates to protecting human skin and/or hair from UVA, UVB or UVC rays with a 5,6-diphenyl-1,2,4-triazinic compounds of general formula wherein: cycle penetrating bonds display an ortho, meta or para indifferent substitution position; identical or different R1 and R2 represent a hydrogen, fluoride, chloride or bromine atom; C1 to C12 linear or branched alkyl, C1 A C18 linear or branched hydroxy, alkoxy poly(ethoxy)-alkoxy with a C1 to C4 alkyl fragment and an ethoxy number ranging from 1 to 4, amino or mono or di-alkylamino with a C1 to C4 alkyl fragment group; R3 represents a chlorine atom, a hydroxy, amino, a phenyl possibly 1 to 3 times substituted by a hydroxy radical situated at least in a para or phenyl position possibly 1 to 3 times substituted in an ortho, meta or para position by a C1 to C12 alkoxy or cyano or alkymino group with a C1 to C7 alkyl fragment in the form of active sun filters or light-protective agents and to cosmetic composition containing said compounds.

Liquid cleansing composition comprising a ternary mixture of anionic surfactants
US Patent 8053400
Publication Date: Nov. 8, 2011
Assignee: Stepan Company