Patent Picks—Sunscreen Particles, Delaying Senescence, Skin Repair and More

By: Rachel L. Grabenhofer

Posted: March 15, 2011

page 5 of 6

Thus, one objective of the present invention is to provide a safe and secure means and/or method for protecting skin from damage due to UV rays. As a result of intensive studies, the present inventors have discovered that skin damage such as the formation of wrinkled skin and/or sagging skin due to UV rays, the formation of skin cancer, or the formation of pigmented spots and/or freckles can be safely prevented or treated by oral dosage of diacylglyceryl ether.

Process for isolation of monophenolic bisaryl triazines
European Patent Application EP2289884
Publication date: March 2, 2011
Assignee: Cytec Technology Corp.

This invention relates to a novel, efficient, economic and general-purpose process for isolating monophenolic-bisaryl triazine compounds from polyphenolic-triazines compounds and other impurities. More specifically, the process involves isolating the monophenolic-bisaryl triazine by contacting it with an inorganic base and optionally, a hydrocarbon solvent. According to the inventors, such a method is valuable and desirable in the field of triazine UV absorbers to isolate monophenolic-bisaryl triazine that is free from the polyphenolic- or polyresorcinol-triazine impurities resulting from the synthesis process without the need for re-crystallization. Some of the advantages of the disclosed method are reportedly its efficient and economic nature.

The present invention also is said to eliminate the need for purifying and isolating the intermediate 2-chloro-4,6-bisaryl-1,3,5-triazine from the first Friedel-Crafts reaction of aromatics with cyanuric chloride regardless of its selectivity, and allows to do the second Friedel-Crafts reaction with phenols, such as resorcinol, in a one-pot process to make monophenol-bisaryl-triazines. 

Method of making compositions comprising multiple layers
US Patent Application 20110045038
Publication date: Feb. 24, 2011
Inventors: Kosaku Yamada, Toshiya Taniguchi, Takashi Yoshida and Kazunori Ogami